The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2008
Filed:
Dec. 31, 2003
Sang Woo Nam, Seoul, KR;
Sang Woo Nam, Seoul, KR;
Dongbu Electronics Co., Ltd., Seoul, KR;
Abstract
An inorganic compound for removing polymers after a semiconductor etching process and related methods and apparatus are disclosed. An example compound includes DIW, HSO, HOand HF. An example method for removing polymers generated during etching processes removes the polymers by using the example compound forms a protective oxide film on at least one of a metal line, a via hole and a pad open area by using HO, and protects the at least one the metal line, the via hole and the pad open area by the protective oxide film while removing the polymers by using HF. An apparatus for manufacturing the example compound includes a plurality of tanks in which DIW, HSO, HOand HF are stored, respectively, a main tank for mixing DIW, HSO, HOand HF supplied from the plurality of tanks through supplying tubes connected between the main tank and the plurality of tanks, flow control devices for controlling flow rates of DIW, HSO, HOand HF, through the supplying tubes, and a pump for circulating a mixture of DIW, HSO, HOand HF stored in the main tank.