The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Apr. 22, 2004
Kuniyuki Takao, Iwata-gun, JP;
Kuniyuki Takao, Iwata-gun, JP;
Minebea Co., Ltd., Kitasaku, JP;
Abstract
A method of manufacturing a color wheel with filter sectors. A resist film formed on a disk-like substrate of the color wheel is shaped into a mask pattern by photo processing, a metal mask which has openings configured similar to the filter sectors but having a slightly larger area than those is set on the substrate, and optical interference filters of a dielectric multi-layer film are formed by an evaporation method or a sputtering method, whereby the optical interference filters are formed so as to cover very limited portions of the mask pattern so that at lift-off process, resist remover can penetrate into the mask pattern from most portions of the mask pattern thus enabling the mask pattern to be removed easily and quickly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile