The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Jan. 06, 2004
Jörg Bewersdorf, Göttingen, DE;
Hilmar Gugel, Dossenheim, DE;
Jörg Bewersdorf, Göttingen, DE;
Hilmar Gugel, Dossenheim, DE;
Leica Microsystems CMS GmbH, Wetzlar, DE;
Abstract
The invention relates to a confocal 4π microscopy method which is characterized by coherently illuminating a sample from two sides by one objective each with illumination light which has at least one illumination wavelength whereby a stationary illumination wave having a main illumination maximum and secondary illumination maxima is produced by interference of the illumination light in the sample. The detection light emitted by the sample has at least one detection wavelength and is detected through the two objectives. The detection light is made to interfere, thereby producing in the sample a detection pattern having a main detection maximum, secondary detection maxima and detection minima in such a manner that the secondary illumination maxima and the detection minima overlap at least partially.