The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
May. 31, 2005
Ki Dong Lee, Sungnam-si, KR;
Seh Won Ahn, Seoul, KR;
Sung Hoon Pieh, Seoul, KR;
Byoung Ho Park, Kyungiu-si, KR;
Gyu Tae Kim, Seoul, KR;
Ki Dong Lee, Sungnam-si, KR;
Seh Won Ahn, Seoul, KR;
Sung Hoon Pieh, Seoul, KR;
Byoung Ho Park, Kyungiu-si, KR;
Gyu Tae Kim, Seoul, KR;
LG Electronics Inc., Seoul, KR;
Abstract
A lithography apparatus is provided. The apparatus includes: a stage, a first light source unit, an optical system, an image obtaining means, an image edit means, an LC panel, and a second light source unit. The LC panel is coupled with the optical system and receives a signal of the image edited by the image edit means and displays the received image to perform a photo mask function. The second light source unit provides light used in performing an exposure on the test material using the imaged displayed on the LC panel for a photo mask.