The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Oct. 06, 2005
Applicants:
Mark A. Church, Los Gatos, CA (US);
Wipul Pemsiri Jayasekara, San Jose, CA (US);
Howard Gordon Zolla, San Jose, CA (US);
Inventors:
Mark A. Church, Los Gatos, CA (US);
Wipul Pemsiri Jayasekara, San Jose, CA (US);
Howard Gordon Zolla, San Jose, CA (US);
Assignee:
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for reducing noise in a lapping guide. Selected portions of a magnetoresistive device wafer are bombarded with ions such that a magnetoresistive effect of lapping guides is reduced. The device is lapped, using the lapping guides to measure an extent of the lapping.
Church, Mark. (2008). Ion bombardment of electrical lapping guides to decrease noise during lapping process (U.S. Patent No. 7332099). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7332099
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile