The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
May. 18, 2004
Tung Say Gip, San Jose, CA (US);
Reinhold Garbe, San Jose, CA (US);
Quoc Nguyen, San Jose, CA (US);
Agilent Technologies, Inc., Santa Clara, CA (US);
Abstract
A non-destructive process for evaluating subsurface damage in an optical element focuses a microscope at points within the optical element and measures the intensity of reflected light. In one embodiment, a microscope focus a laser beam at a measurement point with the optical element and also collects reflected or scattered light from damage in the optical element. Analysis of data indicating the reflected intensities for a three-dimensional array of points within the optical element can determine the location and severity of the subsurface damage.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile