The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Mar. 12, 2004
Yung-hoon Ha, Springfield, VA (US);
Edwin L. Thomas, Natick, MA (US);
Yung-Hoon Ha, Springfield, VA (US);
Edwin L. Thomas, Natick, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Methods are provided for producing a shrunken replica or a shrunken inverse replica of a multicontinuous structure. In one embodiment, the method comprises (1) infiltrating a first multicontinuous structure with a first fluid material which can be immobilized and shrunken, wherein the first multicontinuous structure comprises at least a first phase and a second phase which is immiscible with the first phase, and the infiltration displaces the second phase in the first multicontinuous structure to form a second multicontinuous structure which comprises at least the first phase and a third phase which consists of the first fluid material; (2) immobilizing the infiltrated first fluid material in the second multicontinuous structure; (3) removing the first phase from the second multicontinuous structure; and (4) shrinking (e.g., by a pyrolysis process) the third phase of the second multicontinuous structure, to produce an isotropically shrunken inverse replica of the first multicontinuous structure.