The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7329058 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 12, 2008

Filed:

Dec. 15, 2006
Applicants:

Howard A. Fromson, Stonington, CT (US);

William J. Rozell, Vernon, CT (US);

William J. Ryan, Enfield, CT (US);

Inventors:

Howard A. Fromson, Stonington, CT (US);

William J. Rozell, Vernon, CT (US);

William J. Ryan, Enfield, CT (US);

Assignee:

Anocoil Corporation, Rockville, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01); B41N 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for developing an imaged lithographic printing plate, including the step of delivering developing fluid to the plate at a high volumetric flow rate for a short dwell time such that the non-image is completely solubilized while the image remains unaffected by the developing fluid. At sufficient volumetric flow rate, the developer solution at the target area is constantly displaced during the development time, whereby no boundary layer forms on and travels with the plate during the development time and thus the target area is always in contact with fresh developer solution.


Find Patent Forward Citations

Fromson, Howard. (2008). High flow rate development of photosensitive plates (U.S. Patent No. 7329058). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7329058

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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