The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Jul. 23, 2004
Yanyun Chen, Beijing, CN;
Xin Tong, Beijing, CN;
Stephen S. Lin, Beijing, CN;
Baining Guo, Bellevue, WA (US);
Heung-yeung Shum, Bellevue, WA (US);
Yanyun Chen, Beijing, CN;
Xin Tong, Beijing, CN;
Stephen S. Lin, Beijing, CN;
Baining Guo, Bellevue, WA (US);
Heung-Yeung Shum, Bellevue, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
Techniques are provided for at least modeling any one of mesostructure shadowing, masking, interreflection and silhouettes on a surface, as well as subsurface scattering within a non-homogeneous volume. Such techniques include, at least, acquiring material parameters for a material sample, determining irradiance distribution values for the material sample, synthesizing the material sample onto a mesh of an object. The synthesized object may then be rendered by one of plural rendering techniques.