The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Jun. 06, 2003
Applicants:
Michael Armstrong, Danville, CA (US);
Gayle Herman, Danville, CA (US);
Greg Omweg, Livermore, CA (US);
Ravindra V. Shenoy, Dublin, CA (US);
Inventors:
Michael Armstrong, Danville, CA (US);
Gayle Herman, Danville, CA (US);
Greg Omweg, Livermore, CA (US);
Ravindra V. Shenoy, Dublin, CA (US);
Assignee:
FormFactor, Inc., Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01); C25D 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A halide based stress reducing agent is added to the bath of a rhodium plating solution. The stress reducing agent reduces stress in the plated rhodium, increasing the thickness of the rhodium that can be plated without cracking. In addition, the stress reducing agent does not appreciably decrease the wear resistance or hardness of the plated rhodium.