The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Dec. 18, 2003
Naoki Maeda, Takamatsu, JP;
Kazunori Matsumura, Hamamatsu, JP;
Shigeru Takimoto, Hamamatsu, JP;
Kowa Company Ltd., , JP;
RyuSyo Industrial Co., Ltd., , JP;
Abstract
An ophthalmic photographic apparatus comprises a photographic mask for defining a fundus photography range, a photographic stop for eliminating light reflected from an anterior portion of the eye, and a focusing lens for bringing the fundus into focus. The photographic mask and the photographic stop are interlocked and move as one unit relative to the movement of the focusing lens in such a way that with respect to a photographic optical system, the photographic mask is maintained at a position substantially conjugate with an imaging plane of a CCD and the photographic stop is maintained at a position substantially conjugate with an anterior portion of the eye. The CCD is located at the image-side focal plane of the image-formation lens, the mask is located on the object-side focal plane of the focusing lens, and the photographic stop is located on the image-side focal plane of the focusing lens.