The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Aug. 17, 2004
Eing-seob Cho, Yongin-si, KR;
Jae-song Shim, Seoul, KR;
Hyun-soo Park, Seoul, KR;
Jae-wook Lee, Osan-si, KR;
Jung-hyun Lee, Seoul, KR;
Eun-jin Ryu, Suwon-si, KR;
Eing-seob Cho, Yongin-si, KR;
Jae-song Shim, Seoul, KR;
Hyun-soo Park, Seoul, KR;
Jae-wook Lee, Osan-si, KR;
Jung-hyun Lee, Seoul, KR;
Eun-jin Ryu, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A signal quality measuring method and apparatus in which a quality of a signal detected from an RF signal read out from a disk or a communications channel is measured by using eye pattern signals of the detected RF signals. Eye pattern signals representing time change of a waveform of the detected signal are generated and a signal quality value is generated based on an eye depth and/or an eye width measured from the eye pattern signals. A histogram of the eye pattern signals is used to identify a plurality of main level values which are used as a reference value in measuring the signal quality. Accordingly, signal characteristics in a high-density storage medium system or communication system may be accurately represented.