The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Jun. 01, 2006
Dae Gab Gweon, Daejeon, KR;
Dong Kyun Kang, Daejeon, KR;
Dae Gab Gweon, Daejeon, KR;
Dong Kyun Kang, Daejeon, KR;
Eun Jin Sohn Patent & Law Office, Seoul, KR;
Abstract
The present invention relates to confocal self-interference microscopy. The confocal self-interference microscopy further includes a first polarizer for polarizing reflected or fluorescent light from a specimen, a first birefringence wave plate for separating the light from the first polarizer into two beams along a polarizing direction, a second polarizer for polarizing the two beams from the first birefringence wave plate, a second birefringence wave plate for separating the two beams from the second polarizer into four beams along the polarizing direction, and a third polarizer for polarizing the four beams from the second birefringence wave plate, in the existing confocal microscopy. Optic-axes of the first and second birefringence wave plates exist on the same plane, optic-axes of the first and second birefringence wave plates are inclined from an optical axis of the entire optical system at a predetermined angle, and self-interference spatial periods of the first and second birefringence wave plates are different from each other.