The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Sep. 22, 2005
Kenichi Watanabe, Ootakii, JP;
Kazunari Noguchi, Chiba, JP;
Hiroshi Takanobu, Mobara, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Assuming an aperture diameter of an electron beam aperture formed in a shield cup as Vsc, an aperture diameter of an electron beam aperture formed in an inner electrode of a focusing electrode as V, and a distance between the electron beam aperture formed in the shield cup and the inner electrode as L, the above-mentioned aperture diameter Vsc, the aperture diameter Vand the distance L are determined to satisfy tan θ=(V−Vsc)/2L≧0.08. Due to such a constitution, it is possible to enhance the degree of vacuum in the inside of a cathode ray tube and, it is possible to prevent a getter for elevating the degree of vacuum in the inside of the cathode ray tube and for maintaining the elevated degree of the vacuum from being scattered to the electron gun side thus preventing the deterioration of the characteristics of the electron gun.