The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2008

Filed:

Sep. 29, 2004
Applicants:

Natsuo Tatsumi, Itami, JP;

Akihiko Namba, Itami, JP;

Yoshiki Nishibayashi, Itami, JP;

Takahiro Imai, Itami, JP;

Inventors:

Natsuo Tatsumi, Itami, JP;

Akihiko Namba, Itami, JP;

Yoshiki Nishibayashi, Itami, JP;

Takahiro Imai, Itami, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 9/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for production includes a step for forming concave molds on a surface of a substrate and a step for growing a diamond heteroepitaxially on the substrate in an atmosphere containing a doping material. The crystal structure of the slope of the concave molds of the substrate can have the cubic system crystal orientation (), and the doping material is phosphorous. Further, the substrate is Si, and the slope of the molds can be the Si() face. The diamond electron emission device contains projection parts on the surface thereof, where a slope of the projection partscontains a diamond () face, and flat parts, which are not the projection parts, contain face orientations other than () face or () face and grain boundaries.


Find Patent Forward Citations

Loading…