The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Aug. 31, 2005
Andrew N. Krutchinsky, San Francisco, CA (US);
Herbert Cohen, New York, NY (US);
Brian T. Chait, New York, NY (US);
Andrew N. Krutchinsky, San Francisco, CA (US);
Herbert Cohen, New York, NY (US);
Brian T. Chait, New York, NY (US);
The Rockefeller University, New York, NY (US);
Abstract
A method for manipulating ions in an ion trap includes storing ions, spatially compressing, and ejecting selected ions according to mass-to-charge ratio. An ion trap includes an injection port, an arm having a first and a second end for confining and spatially compressing the ions, and an ejection port for ejecting the ions from the second end. The arm includes two pairs of opposing electrodes, which provide a quadrupole electric field potential at any cross-section of the ion trap. The distance between opposing electrodes and the cross-sectional area of the electrodes increases from the first to second end. The electrodes may be tapered cylindrical rods or of hyperbolic cross-section. Ions selected for ejection are spatially compressed into a region at the second (wider) end. The ion trap may include one arm, with either orthogonal or axial ejection, or two arms with a central insert for orthogonal ejection.