The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2008
Filed:
Nov. 04, 2003
Sang-min Yoon, Kyungki-do, KR;
Seok-cheol Kee, Kyungki-do, KR;
Sang-min Yoon, Kyungki-do, KR;
Seok-cheol Kee, Kyungki-do, KR;
Samsung Electronics Co., Ltd., Suwon, Kyungki-do, KR;
Abstract
The present invention relates to a system and method for detecting a face that is capable of quickly and correctly deciding whether an input facial image is occluded, regardless of any type of facial image to be inputted. The present invention is characterized in that eigenvectors and weights are extracted from the input facial image using principal component analysis (PCA) and the extracted eigenvectors and weights of the user image are substituted into a occluding-decision algorithm, whereby it can be determined whether the facial image is occluded.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile