The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2008

Filed:

Apr. 24, 2003
Applicants:

Dong-gyun Han, Yongin-shi, KR;

Hyung-ho Ko, Seoul, KR;

Young-jun Kim, Gyeongju-shi, KR;

Ki-jong Park, Yongin-shi, KR;

Inventors:

Dong-Gyun Han, Yongin-shi, KR;

Hyung-Ho Ko, Seoul, KR;

Young-Jun Kim, Gyeongju-shi, KR;

Ki-Jong Park, Yongin-shi, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or etching of the semiconductor substrate; even when the substrate has metal layer made of tungsten.


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