The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2008
Filed:
Jun. 04, 2001
Applicant:
Takakuni Ueno, Kanagawa, JP;
Inventor:
Takakuni Ueno, Kanagawa, JP;
Assignee:
Teijin Seiki Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
An optical stereolithographic apparatus performs optical stereolithography by preparing a mask on a light-transmissible member () on the basis of data for one layer with respect to optical stereolithography, exposing an unhardened resin layer () of photohardenable resin to light through the mask, and repeating an exposure operation. The optical stereolithographic apparatus has an optical system in which the light-transmissible member () and the unhardened resin layer () are spaced from each other at a predetermined distance, and the unhardened resin layer () of the photohardenable resin is subjected to a projection exposure through the mask.