The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2008

Filed:

Jul. 29, 2005
Applicant:

Jang-sun Kim, Seoul, KR;

Inventor:

Jang-Sun Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/62 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

Exposure equipment useful in the manufacture of semiconductor devices and a related method of operation are disclosed. The exposure equipment directs light through a reticle and an optical system positioned above a wafer onto a target portion of the wafer, and the wafer is rapidly transferred under the directed light to irradiate substantially the entire surface of the wafer. Recursive compensation for undesired movement of the reticle and optical system caused by the rapid transfer of the wafer is provided.


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