The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Jun. 14, 2005
Applicant:
Jai IL Ryu, Seoul, KR;
Inventor:
Jai Il Ryu, Seoul, KR;
Assignee:
Boe Hydis Technology Co., Ltd., Kyoungki-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for manufacturing an LCD includes the steps of providing a transparent substrate having a thin film transistor and a protective film successively formed thereon, positioning a shadow mask having a number of openings formed thereon to expose parts on which protrusions are to be formed on top of the substrate, forming protrusions by performing a sputtering process on the substrate using the shadow mask in such a manner that sputtering radicals pass through the openings and are selectively deposited on the protective film, removing the shadow mask, and forming a reflection electrode on the substrate including the protrusions.