The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Mar. 28, 2002
Hitoshi Sakamoto, Takasago, JP;
Noriaki Ueda, Kobe, JP;
Takashi Sugino, Toyonaka-shi, Osaka 565-0085, JP;
Hitoshi Sakamoto, Takasago, JP;
Noriaki Ueda, Kobe, JP;
Takashi Sugino, Toyonaka-shi, Osaka 565-0085, JP;
Other;
Abstract
A plasmais generated within a film formation chamber, and mainly a nitrogen gasis excited within the film formation chamber. Then, the excited nitrogen gasis mixed with a diborane gasdiluted with a hydrogen gas to react them, thereby forming a boron nitride filmon a substrate. At the initial stage of film formation, the nitrogen gasis supplied in excess to suppress the occurrence of an amorphous phase on the interface. As a result, the boron nitride filmimproved in moisture absorption resistance on the interface with the substrate and maintaining low dielectric constant properties is formed.