The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2008

Filed:

Apr. 02, 2002
Applicants:

Daniel B. Roitman, Menlo Park, CA (US);

Kevin P. Killeen, Palo Alto, CA (US);

Karen L. Seaward, Palo Alto, CA (US);

Hongfeng Yin, San Jose, CA (US);

Karla Robotti, Mountain View, CA (US);

Inventors:

Daniel B. Roitman, Menlo Park, CA (US);

Kevin P. Killeen, Palo Alto, CA (US);

Karen L. Seaward, Palo Alto, CA (US);

Hongfeng Yin, San Jose, CA (US);

Karla Robotti, Mountain View, CA (US);

Assignee:

Agilent Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 27/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fabrication and adhesion method for a polyaryl-ether-ketone (PAEK) device, such as a microfluidic device, is disclosed. At least one glassy uncrystallized PAEK substrate is heated up to near or above the glass transition temperature to allow the substrate to crystallize from the glass state, while embossing the substrate with patterns. Bonding the PAEK substrate to another substrate is accomplished using a solvent-resistant adhesive, such as a polyimide-based adhesive, in combination with an adhesion enhancement treatment. In certain embodiments, the adhesion enhancement treatment is a plasma treatment or a chemical sulfonation treatment.


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