The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2007

Filed:

Sep. 24, 2002
Applicants:

Peter Speckbacher, Kirchweidach, DE;

Georg Flatscher, Schneizlreuth, DE;

Inventors:

Peter Speckbacher, Kirchweidach, DE;

Georg Flatscher, Schneizlreuth, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G01B 11/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method for producing a scale in the form of a phase grating, the scale itself, and a position measuring device including the scale, the scale includes two reflection layers located at a distance from one another on either side of a spacer layer. The production of the scale includes the following steps: provision of a first reflection layer, which is unbroken over its entire surface and fulfils the relationship A=R/η≧3, where R represents the degree of reflection and η represents the backscatter coefficient for electrons; application of the spacer layer to the first reflection layer; application of the second reflection layer to the spacer layer; and structuring of the second reflection layer by an electron beam lithography process.


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