The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2007

Filed:

Apr. 13, 2005
Applicants:

Anatoliy Lapchuk, Kyeonggi-do, KR;

Ho Seop Jeong, Kyeonggi-do, KR;

Dong Ik Shin, Kyeonggi-do, KR;

Inventors:

Anatoliy Lapchuk, Kyeonggi-do, KR;

Ho Seop Jeong, Kyeonggi-do, KR;

Dong Ik Shin, Kyeonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed herein is a pyramid-shaped near field probe which forms and changes a near field at the aperture of the probe. The pyramid-shaped near field probe of the present invention includes a probe body and metal films. The probe body is constructed in the form of a pyramid using a semiconductor process using a dielectric member and receives an electromagnetic wave. The metal films are symmetrically coated on two predetermined sides of four sides of the probe body while being spaced apart from each other. The pyramid-shaped near field probe allows a surface plasmon wave induced on the surfaces of the metal films due to the electromagnetic wave to progress to the aperture of the probe body through the boundary surface between the probe body and the metal films.


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