The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2007
Filed:
Aug. 17, 2004
Payasada Kotrappa, Frederick, MD (US);
Lorin R. Stieff, Kensington, MD (US);
John C. Dempsey, Frederick, MD (US);
Payasada Kotrappa, Frederick, MD (US);
Lorin R. Stieff, Kensington, MD (US);
John C. Dempsey, Frederick, MD (US);
Rad Elec Inc., Frederick, MD (US);
Abstract
A new type of radon progeny monitor called an electret radon progeny integrating sampling unit (E-RPISU) using an electret ion chamber to measure radon progeny concentration. A conventional 1 LPM particulate air sampling system is used to collect the radon progeny on a roughly 3.5 cmfilter that is mounted on a side of an electret ion chamber such that the collected progeny are exposed to the inside of the chamber. Alpha radiation emitted by the progeny collected on the filter ionizes the air in the approximately 220 ml chamber. Ions of opposite polarity collect on the surface of the electret of suitable thickness and reduce its surface voltage. A specially built surface voltmeter is used to measure the electret voltage before and after sampling. The electret voltage drop that occurs during the sampling period is proportional to the time integrated progeny concentration. A similar unit with a screen in the place of filter is used to measure unattached progeny concentration. Another similar unit without filter is used to provide background response to compute net progeny concentration and also to compute radon concentration.