The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7312354 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 25, 2007

Filed:

Oct. 07, 2004
Applicants:

Hajime Ito, Chiba, JP;

Shinji Tanaka, Chiba, JP;

Inventors:

Hajime Ito, Chiba, JP;

Shinji Tanaka, Chiba, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07C 255/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are an adamantane derivative characterized by having a structure represented by Formula (I) and a process for producing an adamantane derivative in which n is 0 in Formula (I) described above, wherein an adamantane compound is reacted with a nitrile compound and then with acid halide or acid anhydride of (meth)acrylic acids. The adamantane derivative characterized by having a structure represented by Formula (I) is a novel adamantane derivative which is useful as a monomer for functional resins such as a photosensitive resin in the photolithograpy field, and it can efficiently be produced by the production process described above


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Ito, Hajime. (2007). Adamantane derivative and production process for the same (U.S. Patent No. 7312354). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7312354

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