The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2007

Filed:

Oct. 12, 2006
Applicants:

Michio Tsukamoto, Shizuoka, JP;

Masahito Naganawa, Shizuoka, JP;

Inventors:

Michio Tsukamoto, Shizuoka, JP;

Masahito Naganawa, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B60Q 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A low beam light distribution pattern is formed by turning on a first light source unit and a high beam light distribution pattern is formed by additionally turning on a second light source unit. The second reflector of the second light source unit has reflecting faces of vertical cross-sectional shapes formed by two types of ellipses whose first focal point is on a center of emission of a second light-emitting element and whose second focal points are respectively positioned on points A, B. The additional lens whose rear focal points are on the second focal points A, B is arranged on a circumference of a projection lens. When the second light source unit is turned on, a high beam additional light distribution pattern is formed that vertically strides over the cutoff line of the low beam light distribution pattern.


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