The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2007
Filed:
Jun. 26, 2003
Jung-wook Kim, Osan-si, KR;
Hyeon-deok Lee, Seoul, KR;
Jin-gi Hong, Suwon-si, KR;
Ji-soon Park, Suwon-si, KR;
Eung-joon Lee, Suwon-si, KR;
Jung-wook Kim, Osan-si, KR;
Hyeon-Deok Lee, Seoul, KR;
Jin-Gi Hong, Suwon-si, KR;
Ji-Soon Park, Suwon-si, KR;
Eung-Joon Lee, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon, Kyungki-Do, KR;
Abstract
A method for cleaning a processing chamber and manufacturing a semiconductor device by removing impurities from a substrate in the processing chamber with a plasma of a first gas including hydrogen gas. After the substrate is removed from the processing chamber, the processing chamber is etched with the plasma of a non-hydrogenous second gas. Thus, the etching selectivity can be improved and the particles are prevented from depositing and/or forming on the substrate.