The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2007

Filed:

Aug. 06, 2004
Applicants:

Nozomu Hayashi, Tochigi, JP;

Yukihiro Yokota, Tochigi, JP;

Inventors:

Nozomu Hayashi, Tochigi, JP;

Yukihiro Yokota, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of measuring a position of a mark in a chamber in which a pressure inside the chamber is different from a pressure outside the chamber. The method includes a first detection step of detecting a reference mark fixedly disposed in the chamber, through a window arranged on the chamber, using a detector disposed outside the chamber, a second detection step of detecting the mark movable with respect to the reference mark in the chamber through the window using the detector, and a calculation step of calculating a position of the mark with respect to the reference mark based on detection results of the first and second detection steps, so as to suppress a detection error caused by at least one of deformations of the chamber and the window, in which at least one deformation is due to a difference between the pressure inside the chamber and the pressure outside the chamber.


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Hayashi, Nozomu. (2007). Mark position measuring method and apparatus (U.S. Patent No. 7310146). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7310146

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