The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2007
Filed:
Mar. 31, 2004
Chung J. Lee, Fremont, CA (US);
Atul Kumar, Santa Clara, CA (US);
Chieh Chen, Palo Alto, CA (US);
Yuri Pikovsky, San Jose, CA (US);
Chung J. Lee, Fremont, CA (US);
Atul Kumar, Santa Clara, CA (US);
Chieh Chen, Palo Alto, CA (US);
Yuri Pikovsky, San Jose, CA (US);
Dielectric Systems, Inc., Fremont, CA (US);
Abstract
A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed between a first silane-containing layer and a second silane-containing layer. The system includes a process module having a processing chamber and a monomer delivery system configured to admit a gas-phase monomer into the processing chamber for deposition of the low dielectric constant polymer layer, a post-treatment module for annealing the composite polymer dielectric film, and a silane delivery system configured to admit a vapor flow containing a silane precursor into at least one of the process module and the post-treatment module for the formation of the first silane-containing layer and the silane-containing layer.