The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Feb. 03, 2004
Applicants:
M. Brandon Steele, Decatur, GA (US);
Jeffrey Alan Hawthorne, Decatur, GA (US);
Chunho Kim, Duluth, GA (US);
David C. Sowell, Atlanta, GA (US);
Inventors:
M. Brandon Steele, Decatur, GA (US);
Jeffrey Alan Hawthorne, Decatur, GA (US);
Chunho Kim, Duluth, GA (US);
David C. Sowell, Atlanta, GA (US);
Assignee:
Qcept Technologies, Inc., Atlanta, GA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 5/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.