The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Dec. 12, 2001
Christian Bernatek, Rodgau, DE;
Frank Kellner, Bad Hersfeld, DE;
Peter March, Frankfurt, DE;
Atlas Material Testing Technology GmbH, Linsengericht-Altenhablau, DE;
Abstract
In this method, the surface to be investigated is first of all exposed to collimated light and the radiation rejected therefrom supplied to a position-resolving image processing means. Then, a mask is generated on the basis of the image supplied by the image processing means, said mask having masked regions being defined by relatively bright areas of said image and unmasked regions being defined by relatively dark areas of said image. Now, the surface to be investigated is exposed to diffuse light and the radiation rejected therefrom supplied to the image processing means, with only the radiation from the unmasked regions being taken into consideration for analyzing purposes.