The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2007

Filed:

Jan. 28, 2003
Applicants:

Wolfgang Moehl, Worms, DE;

Lars Bewig, Bad Gandorsheim, DE;

Thomas Kuepper, Bad Gandersheim, DE;

Wolfram Maring, Hamburg, DE;

Christopher Moelle, Bad Gandersheim, DE;

Inventors:

Wolfgang Moehl, Worms, DE;

Lars Bewig, Bad Gandorsheim, DE;

Thomas Kuepper, Bad Gandersheim, DE;

Wolfram Maring, Hamburg, DE;

Christopher Moelle, Bad Gandersheim, DE;

Assignee:

Schott AG, Mainz, DE;

Attorney:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); H01J 61/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOand SiOby means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.


Find Patent Forward Citations

Loading…