The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2007

Filed:

Apr. 27, 2005
Applicants:

Yoshihide Matsuo, Nagano, JP;

Katsuji Arakawa, Nagano, JP;

Inventors:

Yoshihide Matsuo, Nagano, JP;

Katsuji Arakawa, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01D 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a nozzle plateis disclosed. The nozzle platehas a plurality of nozzle openingsthrough each of which a droplet is adapted to be ejected. The method includes the steps of: preparing a processing substrate (silicon substrate) constituted from silicon as a main material, the processing substrate having two major surfaces; providing a supporting substratefor supporting the processing substrate onto one major surface of the processing substrate; and forming the plurality of nozzle openingson the other major surface of the processing substrate by subjecting the other major surface of the processing substrate to an etching process while the processing substrate is supported by the supporting substrate


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