The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2007

Filed:

Dec. 23, 1999
Applicants:

Masatsugu Hatanaka, Kashiwara, JP;

Junichi Tanaka, Nara, JP;

Toru Tanigawa, Ikoma, JP;

Yasunobu Tagusa, Ikoma, JP;

Inventors:

Masatsugu Hatanaka, Kashiwara, JP;

Junichi Tanaka, Nara, JP;

Toru Tanigawa, Ikoma, JP;

Yasunobu Tagusa, Ikoma, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing light substantially perpendicular to the substrate and receiving light reflected from the substrate, and an analyze unit analyzing thickness of a thin film of the substrate according to intensity of reflected light received by the light receiving/projecting unit.


Find Patent Forward Citations

Hatanaka, Masatsugu. (2007). Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light (U.S. Patent No. 7304744). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7304744

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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