The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Dec. 23, 1999
Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light
Applicants:
Masatsugu Hatanaka, Kashiwara, JP;
Junichi Tanaka, Nara, JP;
Toru Tanigawa, Ikoma, JP;
Yasunobu Tagusa, Ikoma, JP;
Inventors:
Masatsugu Hatanaka, Kashiwara, JP;
Junichi Tanaka, Nara, JP;
Toru Tanigawa, Ikoma, JP;
Yasunobu Tagusa, Ikoma, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing light substantially perpendicular to the substrate and receiving light reflected from the substrate, and an analyze unit analyzing thickness of a thin film of the substrate according to intensity of reflected light received by the light receiving/projecting unit.