The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Mar. 16, 2005
Dario Gil, Cambridge, MA (US);
Rajesh Menon, Boston, MA (US);
David Carter, Cambridge, MA (US);
Henry I. Smith, Sudbury, MA (US);
George Barbastathis, Belmont, MA (US);
Dario Gil, Cambridge, MA (US);
Rajesh Menon, Boston, MA (US);
David Carter, Cambridge, MA (US);
Henry I. Smith, Sudbury, MA (US);
George Barbastathis, Belmont, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.