The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Jun. 28, 2005
Jae Chang Jung, Seoul, KR;
Cheol Kyu Bok, Gyunggi-do, KR;
Chang Moon Lim, Gyunggi-do, KR;
Seung Chan Moon, Gyunggi-do, KR;
Jae Chang Jung, Seoul, KR;
Cheol Kyu Bok, Gyunggi-do, KR;
Chang Moon Lim, Gyunggi-do, KR;
Seung Chan Moon, Gyunggi-do, KR;
Hynix Semiconductor Inc., Gyunggi-do, KR;
Abstract
Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein Ris a Chydrocarbon or a Chydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; Ris hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, and d equals one. Since the photoacid generating polymer of Formula 1 is not water-soluble and acts as a photoacid generator, it can be used to prepare a top anti-reflective coating composition for immersion lithography.