The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Feb. 22, 2005
Lutz Parthier, Kleinmachnow, DE;
Joerg Staeblein, Jena, DE;
Gunther Wehrhan, Jena, DE;
Christian Kusch, Jena, DE;
Lutz Parthier, Kleinmachnow, DE;
Joerg Staeblein, Jena, DE;
Gunther Wehrhan, Jena, DE;
Christian Kusch, Jena, DE;
Schott AG, Mainz, DE;
Abstract
A method is described for making an especially not-(111)-oriented low-stress large-volume crystal having a glide plane with reduced stress birefringence and more uniform refractive index. The method includes growing and tempering the crystal while heating and/or cooling to form a temperature gradient in order to relax stresses arising along the glide plane. During the tempering the heating and/or cooling occurs by heat transfer in a heat transfer direction and the heat transfer direction or temperature gradient is oriented at an angle of from 5° to 90° to the glide plane. Crystals with a uniform refractive index with variations of less than 0.025×10(RMS value) are produced by the method.