The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2007

Filed:

Sep. 12, 2006
Applicants:

Manoocher Birang, Los Gatos, CA (US);

Lawrence M. Rosenberg, San Jose, CA (US);

Sasson Somekh, Los Altos, CA (US);

John M. White, Hayward, CA (US);

Inventors:

Manoocher Birang, Los Gatos, CA (US);

Lawrence M. Rosenberg, San Jose, CA (US);

Sasson Somekh, Los Altos, CA (US);

John M. White, Hayward, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to incrementally advance the polishing sheet in a linear direction relative to the platen. The chucking mechanism is configured to intermittently secure the portion of the polishing sheet to the platen.


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