The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Oct. 27, 2005
Applicants:
Dane Chang, Sugar Land, TX (US);
Yunwa W. Cheung, Lake Jackson, TX (US);
Charles F. Diehl, Lake Jackson, TX (US);
Joseph M. Vihtelic, Whitehall, MI (US);
Inventors:
Dane Chang, Sugar Land, TX (US);
Yunwa W. Cheung, Lake Jackson, TX (US);
Charles F. Diehl, Lake Jackson, TX (US);
Joseph M. Vihtelic, Whitehall, MI (US);
Assignees:
Howmet Research Corporation, Whitehall, MI (US);
Dow Global Technologies, Inc, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22C 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A fugitive pattern for making a shell mold for investment casting a metal or alloy comprises a substantially random interpolymer and a low molecular weight polymer in proportions to provide a fugitive pattern having a combination of properties suitable for use in making the shell molds.