The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jul. 27, 2005
Scott H. Bloom, Encinitas, CA (US);
Harry Rieger, San Diego, CA (US);
James J. Alwan, Ramona, CA (US);
Scott H. Bloom, Encinitas, CA (US);
Harry Rieger, San Diego, CA (US);
James J. Alwan, Ramona, CA (US);
Gatan, Inc., Warrendale, PA (US);
Abstract
A laser produced plasma device comprises a shutter assembly for mitigating the contaminating effects of debris generated by the plasma. In one embodiment, the shutter assembly includes a rotatable shutter having at least one aperture that provides a line-of-sight between a radiation source and an exit of the device during a first period of rotation of the shutter, and obstructs the line-of-sight between the radiation source and the exit during a second period of rotation. The shutter assembly in this embodiment also includes a motor configured to rotate the shutter to permit passage of the X-rays through the at least one aperture during the first period of rotation, and to thereafter rotate the shutter to obstruct passage of the debris through the at least one aperture during the second period of rotation.