The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jun. 16, 2006
Seung-hyuk Chang, Seongnam-si, KR;
I-hun Song, Seongnam-si, KR;
Young-soo Park, Suwon-si, KR;
Suk-pil Kim, Yongin-si, KR;
Hoon Kim, Siheung-si, KR;
Seung-Hyuk Chang, Seongnam-si, KR;
I-Hun Song, Seongnam-si, KR;
Young-Soo Park, Suwon-si, KR;
Suk-Pil Kim, Yongin-si, KR;
Hoon Kim, Siheung-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Example embodiments are directed to an off-axis projection optical system including first and second mirrors that are off-axially arranged. The tangential and sagittal radii of curvature of the first mirror may be Rand R, respectively. The tangential and sagittal radii of curvature of the second mirror may be Rand R, respectively. The incident angle of the beam from an object point to the first mirrormay be i, and an incident angle of the beam reflected from the first mirrorto the second mirroris i. The values of R, R, R, R, iand imay satisfy the following EquationRcos i=Rcos iR=RcosiR=Rcosi.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile