The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2007

Filed:

Apr. 14, 2005
Applicants:

Chang-hsin Chu, Tan Tzu Hsiang, TW;

Kuo-hui Yu Chu, Hsin Kang Hsiang, TW;

Shi-ming Chen, Tainan, TW;

Inventors:

Chang-Hsin Chu, Tan Tzu Hsiang, TW;

Kuo-Hui Yu Chu, Hsin Kang Hsiang, TW;

Shi-Ming Chen, Tainan, TW;

Assignee:

Epitech Technology Corporation, Tainan County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 1/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lighting device and a method for manufacturing the same are described. First, a semiconductor layer of a first electrical property, an active layer and a semiconductor layer of a second electrical property are sequentially formed, and part of them are removed to form a mesa. A transparent contact layer is formed thereon, and thus forms a stack. Afterwards, a passivation layer is deposited on the stack and a first part of the semiconductor layer of the first electrical property adjacent to the stack. Part of the passivation layer is removed to expose part of the transparent contact layer. Then, an electrode of the second electrical property is formed on the exposed transparent contact layer. Afterwards, the electrode of the second electrical property is extended to the passivation layer on the first part of the semiconductor layer of the first electrical property to form a guard ring.


Find Patent Forward Citations

Loading…