The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jul. 11, 2006
Steven Gerard Mayorga, Oceanside, CA (US);
Manchao Xiao, San Diego, CA (US);
Thomas Richard Gaffney, Carlsbad, CA (US);
Robert George Syvret, Allentown, PA (US);
Steven Gerard Mayorga, Oceanside, CA (US);
Manchao Xiao, San Diego, CA (US);
Thomas Richard Gaffney, Carlsbad, CA (US);
Robert George Syvret, Allentown, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.