The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jun. 07, 2006
Michael G. Mikhael, Tucson, AZ (US);
Angelo Yializis, Tucson, AZ (US);
Richard E. Ellwanger, Tucson, AZ (US);
Michael G. Mikhael, Tucson, AZ (US);
Angelo Yializis, Tucson, AZ (US);
Richard E. Ellwanger, Tucson, AZ (US);
Sigma Laboratories of Arizona, LLC, Tucson, AZ (US);
Abstract
A plasma is produced in a treatment space () by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes () separated by a dielectric material (), a precursor material is introduced into the treatment space to coat a substrate film or web () by vapor deposition or atomized spraying at atmospheric pressure. The deposited precursor is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Additional plasma post-treatment may be used to enhance the properties of the resulting coated products.