The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Apr. 26, 2006
Hideto Motoshima, Izumi, JP;
Hisanobu Shimodozono, Izumi, JP;
Junji Nishimoto, Izumi, JP;
Makoto Horinouchi, Izumi, JP;
Shouichi Sonohata, Izumi, JP;
Hideto Motoshima, Izumi, JP;
Hisanobu Shimodozono, Izumi, JP;
Junji Nishimoto, Izumi, JP;
Makoto Horinouchi, Izumi, JP;
Shouichi Sonohata, Izumi, JP;
NEC LCD Technologies. Ltd., Kanagawa, JP;
Abstract
Disclosed is a photoresist film which is formed in a manner of covering at least a source electrode, a source line, a pixel electrode, a drain electrode, a drain line, a semiconductor film and a protective film, and further covering a gate insulting film in their vicinities. Moreover, wet and dry etchings are sequentially performed by using the photoresist film as a mask. Due to this etching, a residual pattern existing on the gate insulating film is etched.