The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jun. 24, 2005
Applicants:
Wouter Ijdo, Trenton, NJ (US);
Steven Kemnetz, Trenton, NJ (US);
Wilbur Mardis, Holland, PA (US);
Daphne Benderly, Metuchen, NJ (US);
Inventors:
Wouter Ijdo, Trenton, NJ (US);
Steven Kemnetz, Trenton, NJ (US);
Wilbur Mardis, Holland, PA (US);
Daphne Benderly, Metuchen, NJ (US);
Assignee:
Elementis Specialties, Inc., Highstown, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 30/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for determining degree of organoclay delamination and degree of layer alignment in a polymer organoclay nanocomposite comprising one or more infrared light spectral measurements selected from the group consisting of (A) Si—O absorption bandwidth, (B) Si—O absorption band intensity, (C) Si—O absorption band area, and (D) Si—O absorption anisotropy.