The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Aug. 18, 2003
Chien-wei LI, Livingston, NJ (US);
Derek Raybould, Denville, NJ (US);
Thomas E. Strangman, Prescott, AZ (US);
Bjoern Schenk, Phoenix, AZ (US);
Chien-Wei Li, Livingston, NJ (US);
Derek Raybould, Denville, NJ (US);
Thomas E. Strangman, Prescott, AZ (US);
Bjoern Schenk, Phoenix, AZ (US);
Honeywell International, Inc., Morristown, NJ (US);
Abstract
A component comprising a silicon-based substrate and a diffusion barrier coating disposed on the silicon-based substrate. The diffusion barrier coating comprises an isolation layer disposed directly on the silicon-based substrate and at least one oxygen barrier layer disposed on the isolation layer. The oxygen barrier layer prevents the diffusion of oxygen therethrough, and prevents excessive oxidation of the silicon-based substrate. The isolation layer(s) prevent contaminants and impurities from reacting with the oxygen barrier layer. An environmental barrier coating may be disposed on the diffusion barrier coating, and a thermal barrier coating may be disposed on the environmental barrier coating. Methods for making a component having a diffusion barrier coating are also disclosed.