The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jun. 01, 2004
John N. Gregg, Marble Falls, TX (US);
Scott L. Battle, Cedar Park, TX (US);
Jeffrey I. Banton, Burnet, TX (US);
Donn K. Naito, Marble Falls, TX (US);
Ravi Laxman, San Jose, CA (US);
John N. Gregg, Marble Falls, TX (US);
Scott L. Battle, Cedar Park, TX (US);
Jeffrey I. Banton, Burnet, TX (US);
Donn K. Naito, Marble Falls, TX (US);
Ravi Laxman, San Jose, CA (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
Structure helps support material in a container with an increased exposed surface area to help promote contact of a gas with vaporized material. For at least one disclosed embodiment, the structure may help support material for vaporization in the same form as when the material is placed at the structure. For at least one disclosed embodiment, the structure may help support material with an increased exposed surface area relative to a maximum exposed surface area the material could have at rest in the container absent the structure. For at least one disclosed embodiment, the structure may define one or more material support surfaces in an interior region of the container in addition to a bottom surface of the interior region of the container. For at least one disclosed embodiment, the structure may define in an interior region of the container one or more material support surfaces having a total surface area greater than a surface area of a bottom surface of the interior region of the container. For at least one disclosed embodiment, gas resulting from contact of received gas with vaporized material may be delivered to atomic layer deposition (ALD) process equipment.